Volume 9, Issue 3 (11-2019)                   PCNM 2019, 9(3): 42-49 | Back to browse issues page


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Adel-Mehraban M, Mahdian A, Alavi M. How Managers are Related To Techno-Stress in Organization. PCNM 2019; 9 (3) :42-49
URL: http://nmcjournal.zums.ac.ir/article-1-616-en.html
Assistant Professor, Research Center for Nursing and Midwifery, Department of Management and Community Health, Faculty of Nursing and Midwifery, University of Medical Sciences, Isfahan, Iran , adel@nm.mui.ac.ir
Abstract:   (6735 Views)
Background: Technology has made the quality of health care evolve, and widely deployed in healthcare service systems, but the entrance of technology to a defective system would intensify the same problems and the stress resulting from its application to users, which is called "Techno-stress".
Objectives: This study aimed to assess the relationship between Technology Management and Techno-stress level among nurses. Data were analyzed using mean, standard deviation, Pearson and linear regression in SPSS 16.
Methods: This survey was conducted to evaluate the frequency, intensity and levels of “Techno-stress and its dimensions” and “Technology Management by Two validated questionnaires.
Results: The mean score of Techno-stress in the studied samples (195 registered nurses) was 51.55 ± 15.607 (highest mean score in the field of feeling pressure and the lowest mean score in the technology involving). In addition, there was a significant correlation Technology Management and the Techno-stress score (r= -0.242, p<0.001). In addition, the highest correlation between the score of the Technology Management and the feeling stress (r= 0.422, p<0.001).
Implication Conclusions: Nurses experience an overall relative Techno-stress and this related to nursing how managers do about technology. Nursing managers of medical centers need to plan to eliminate the stress caused by the use of technology and better management in order to eliminate and prevent the Techno-stress.
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Type of Study: Orginal research | Subject: Nursing
Received: 2020/01/18 | Accepted: 2019/11/1 | Published: 2019/11/1

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